Amorphous Silicon
Mostrando 1-12 de 56 artigos, teses e dissertações.
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1. Study of Crystallization and Composition on Silicon Oxycarbide (SiOC) and Silicon Boron Oxycarbide (SiBOC) Ceramics Obtained from Alkoxysilanes Precursors
This work deals on the preparation of silicon oxycarbide (SiOC) and silicon boron oxycarbide (SiBOC) ceramics from pyrolysis involving alkoxysilanes with different organic groups. Boron content, organic substituent and annealing time were evaluated on crystallization and composition of resulting ceramics. B-free precursors composed of methyltriethoxysilane (
J. Braz. Chem. Soc.. Publicado em: 2021-06
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2. An Amorphous Silicon Photo TFT with Si3N4/Al2O3 or HfO2 Double Layered Insulator for Digital Imaging Applications
Abstract This paper focuses on amorphous silicon photo thin-film transistors with double layered insulator using Si3N4/Al2O3 or HfO2 as candidates for the succession of Si3N4 as a traditional insulator in the fabrication of hydrogenated amorphous silicon thin-film transistors. Whether for industry or for research, there is a need to investigate the use of th
J. Microw. Optoelectron. Electromagn. Appl.. Publicado em: 2019-03
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3. Densification and microstructure of Si3N4-TiN ceramic composites
Abstract Silicon nitride is a ceramic material widely used in various structural applications at high temperatures owing to its excellent combination of mechanical and thermal properties. To increase the application of Si3N4, many researches have been developed to improve its fracture toughness and processing conditions. In this study, the sintering and micr
Cerâmica. Publicado em: 2019-01
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4. Annealing effects on the structural and optical properties of vanadium oxide film obtained by the hot-filament metal oxide deposition technique (HFMOD)
ABSTRACT Vanadium oxide films amorphous, nonstoichiometric and highly absorbing in the optical region were deposited on ITO-coated glass and on silicon substrates, by the hot-filament metal oxide deposition technique (HFMOD) and oxidized by ex-situ annealing in a furnace at 200, 300, 400 and 500 ºC, under an atmosphere of argon and rarefied oxygen. X-ray di
Matéria (Rio J.). Publicado em: 11/05/2017
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5. Structural and Mechanical Properties of Zr-Si-N Thin Films Prepared by Reactive Magnetron Sputtering
Zirconium silicon nitride (ZrSiN) thin films were deposited by reactive magnetron sputtering in order to verify the silicon influence on coating morphology and mechanical properties. The Si/(Zr+Si) ratio was adjusted between 0 to 15% just modifying the power applied on the silicon target. Only peaks associated to ZrN crystalline structure were observed in XR
Mat. Res.. Publicado em: 23/10/2015
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6. VIDROS DE OXICARBETO DE SILÍCIO OBTIDOS A PARTIR DE POLISSILOXANOS
AbstractSilicon oxycarbide glasses (SiOC) are a class of amorphous materials with a similar silica glass structure, in which oxygen atoms are partially replaced by tetracoordenated carbon atoms. The presence of carbon atoms covalently bound to the silicon atoms creates a more interconnected structure with better strength, and excellent chemical stability tha
Quím. Nova. Publicado em: 2015-08
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7. Performance of single wire earth return transformers with amorphous alloy core in a rural electric energy distribution system
In this paper are presented some considerations about the performance of single wire earth return amorphous alloy core transformers in comparison with conventional silicon steel sheets cores transformers used in rural electric energy distribution network. It has been recognized that amorphous metal core transformers improve electrical power distribution effi
Mat. Res.. Publicado em: 08/05/2012
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8. Efeito de lente térmica e não-linearidades ópticas do silício amorfo hidrogenado dopado com fósforo. / Thermal lens effect and optical nonlinearities of hidrogenated amorphous silicon doped with phosphorus.
Efeitos ópticos não-lineares foram estudados em filmes finos de silício amorfo hidrogenado através da técnica de varredura-Z, que utiliza um único feixe de luz laser de onda contínua, modulado na escala de tempo de milissegundos. Em tal técnica, amostras do material foram deslocadas ao longo da região focal de um feixe com perfil de intensidade gaus
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 16/06/2011
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9. Deposição de filmes finos de silício amorfo hidrogenado por sputtering reativo. / Deposition of hydrogenated amorphous silicon thin films by reactive sputtering.
Neste trabalho filmes finos de silício amorfo hidrogenado (a-Si:H) foram depositados no reator magnetron sputtering do laboratório de sistemas integráveis (LSI), a temperaturas menores que 100 °C, pela introdução do gás hidrogênio junto com o de argônio para pulverização de um alvo de silício policristalino. As condições de deposição investig
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 21/10/2010
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10. Study of optical and electro-optical properties of diamond-like carbon films - DLC. / Estudo das propriedades ópticas e eletro-ópticas de filmes de carbono amorfo tipo diamante - DLC.
In this work it was studied electrical and optical characteristics of diamond-like carbon (DLC) films deposited in a reactive RF magnetron sputtering system on silicon and glass substrates. Samples were deposited at different process conditions in each type of substrate at two pressure conditions (5 mTorr and 10 mTorr) and four conditions of RF power (100 W,
Publicado em: 2010
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11. Camadas antirrefletoras de carbono amorfo e carbeto de silicio para celulas solares de silicio cristalino / Antireflective coatings of amorphous carbon and silicon for crystalline silicon solar cells
Nesta tese estamos propondo o uso de carbono amorfo como um possível candidato para uso como camada antirrefletora em células solares de silício cristalino. O carbono amorfo pode ser preparado com alta banda proibida e tem propriedades importantes como alta dureza, baixo coeficiente de atrito, preparado à temperatura ambiente, etc. Além disso, o carbono
Publicado em: 2009
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12. Silicon nanocrystals and zinc oxide nanowires with erbium / Nanocristais de silicio e nanofios de oxido de zinco com erbio
We present a study of erbium luminescence in silicon nanocrystals (nc-Si) and zinc oxide nanowires (nw-ZnO). Silicon nanocrystals are produced by annealing of amorphous sub-oxide thin films (SiOx) prepared by rf-sputtering varying the oxygen and erbium concentration during growth. Erbium is added by partially covering the silicon target surface with small pi
Publicado em: 2009