DLC Films Grown On Steel Using An Innovator Active Screen System For PECVD Technique
AUTOR(ES)
Silva, Patrícia Cristiane Santana da, Ramos, Marco Antonio Ramirez, Corat, Evaldo José, Trava-Airoldi, Vladimir Jesus
FONTE
Mat. Res.
DATA DE PUBLICAÇÃO
07/07/2016
RESUMO
In this work, an active screen plasma discharge system based technology was incorporated in a PECVD reactor for DLC films growth, making it a new development in DLC films deposition. In this case, the active screen system is used to seek better electrons confinement, which might result in high ions density due to the collisions number increase, leading to a possible increase in ionization. DLC films were grown on steel substrates, using two variations of this system. In order to enhance adhesion between coating and substrate, a silicon interlayer was deposited, using different bias voltages. Morphological and structural characterization was performed by scanning electron microscopy, optical profilometry and Raman scattering spectroscopy. Tribological tests were performed by nanohardness, scratch and wear tests. Results showed that the plasma confinement promoted good films adhesion, which may be related to a high sub-implantation. This might be a consequence of the pressure decrease, as well as, to the ions energy distribution narrowing.
Documentos Relacionados
- Effect of PECVD deposition parameters on the DLC/PLC composition of a-C:H thin films
- Modificação da superfície do aço para melhorias na aderência de filmes de DLC
- Analysis of SiO2 Thin Films Deposited by PECVD Using an Oxygen-TEOS-Argon Mixture
- Pulsed dc discharge in the presence of active screen for nitriding of high carbon steel
- Characterization of interference thin films grown on stainless steel surface by alternate pulse current in a sulphochromic solution