Modificação estrutural em silica vitrea e quartzo cristalino por implantação de He+ para guiamento optico

AUTOR(ES)
DATA DE PUBLICAÇÃO

1996

RESUMO

The purpose of this work was to study the technical application of íon implantation to modify the refraction index on vitreous and crystallines substrates, allowing the optical guidance. We have implanted HE + ions with energies from 30 to 190 KeV and doses from 1.0x10 16 to 2.5x10 16 ions/cm 2 in vitreous silica and crystalline quartz substrates, with perpendicular cut to the X, Y and Z axis. To optical characterization, it have been made refraction index measurements on Transveral Eletric (TE) and Transversal Magnetic propagation modes of an orgon ion laser beam, at λ 488,0 nm, through the Dark Modes method. We have studied the dose variations, energy and annealing effects on the propagation modes in the modified layer. We have also used different techniques on the infrared spectroscopy to analyze the structural modifications on the silicates by the helium ions bombardment. Analysis by X ray diffraction have also been used to analyze the single quartz crystal and modified by the ions implantation.

ASSUNTO(S)

cristais de quartzo guias de ondas oticas silica vitreo dispositivos optoeletronicos implantação ionica

ACESSO AO ARTIGO

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