Plasma-deposited a-C(N): H films

AUTOR(ES)

Franceschini, D.F.

FONTE

Brazilian Journal of Physics

DATA DE PUBLICAÇÃO

2000

RESUMO

The growth behaviour, film structure and mechanical properties of plasma-deposited amorphous hydrogenated carbon-nitrogen films are shortly reviewed. The effect of nitrogen-containing gas addition to the deposition to the hydrocarbon atmospheres used is discussed, considering the modifications observed in the chemical composition growth kinetics, carbon atom hybridisation and chemical bonding arrangements of a-C(N):H films. The overall structure behaviour is correlated to the variation of the mechanical properties.

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