Etching Silicon
Mostrando 1-12 de 44 artigos, teses e dissertações.
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1. Superhydrophobic silicon fabricated by phosphomolybdic acid-assisted electrochemical etching
Controllable geometry silicon surfaces with superhydrophobicity are difficult to be fabricated without photolithography techniques. Superhydrophobic silicon surfaces with water contact angle larger than 150º and sliding angle less than 10º have been successfully fabricated by electrochemical etching strategy. Squarelike hole arrays with controllable geomet
Quím. Nova. Publicado em: 26/08/2019
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2. Doped Silicon Nanowires for Lithium Ion Battery Anodes
Nanostructured silicon (Si) has showed outstanding results as Li-ion battery anode material. Fabrication of nanostructured silicon anode materials is usually very complex, time consuming and expensive. In this work, silicon nanowires (SiNW`s) were produced by using rapid and uncostly metal catalyzed electroless etching (MCEE) method from various silicon wafe
Mat. Res.. Publicado em: 17/01/2019
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3. Caracterización del proceso de fabricación de macroporos sobre sustrato de silicio por método electroquímico
ABSTRACT In the present work, the fabrication process of a set of micropores on crystalline silicon wafers manufactured through wet etching technique was studied. The influence of different control factors such as voltage, temperature and braking agent on the specific characteristics of formation was evaluated. An exhaustive analysis of the evolution of elec
Matéria (Rio J.). Publicado em: 19/07/2018
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4. Silicon Nanostructuring Using SF6/O2 Downstram Plasma Etching: Morphological, Optical and Sensing Properties
Silicon (Si) nanostructures were prepared in the downstream of radiofrequency SF6/O2 mixture plasma generated in 13.56 MHz hollow cathode discharge system. Depending on the oxygen percentage in the mixture, the obtained Si nanostructures were characterized for their different properties: etching rate, morphology, optical reflectance, photoluminescence, spect
Mat. Res.. Publicado em: 10/07/2018
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5. Boron Doped Ultrananocrystalline Diamond Films on Porous Silicon: Morphological, Structural and Electrochemical Characterizations
Boron doped ultrananocrystalline diamond (BDUND) films were grown and characterized on porous silicon (PS) substrates. PS samples were prepared from n-type monocrystalline silicon wafers (100) with 1-20 Ω.cm of resistivity, by electrochemical etching, using HF-acetonitrile solution as electrolyte. BDUND films were grown by Hot Filament Chemical Vapor Deposi
Mat. Res.. Publicado em: 24/11/2015
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6. Evaluation of piezoresistivity properties of sputtered ZnO thin films
Zinc oxide (ZnO) thin films were deposited by RF reactive magnetron sputtering on silicon (100) substrates under different experimental conditions. ZnO films were studied before and after annealing treatment at 600 °C. The crystallinity, electrical resistivity, stoichiometry, thickness, and elastic modulus of the films were investigated. ZnO piezoresistors
Mat. Res.. Publicado em: 03/06/2014
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7. Desenvolvimento de dispositivos bolométricos para detecção de radiação infravermelha distante = : Development of bolometric devices for far-infrared radiation detection / Development of bolometric devices for far-infrared radiation detection
This work has as a main goal the fabrication and characterization of thermal sensors, described as bolometrics, which are dedicated to detection of far infrared radiation. These sensors are fabricated using microfabrication techniques and the thin films are selectives to wet etching. These mechanical microstructures are formed on silicon wafers using a surfa
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 11/07/2012
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8. Optimized microlens-array geometry for Hartmann-Shack wavefront sensor: design, fabrication and test
The Hartmann-Shack (H-S) wavefront sensor is now deployed in many different fields, from astronomy to industrial inspection, where the quality of optical media or components can be measured by the distortions (wavefront aberrations) they impart on a wavefront transmitted or reflected by them. In ophthalmology, this sensor is a core component of major aberrom
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 29/02/2012
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9. Influence of sodium hypochlorite and edta on the microtensile bond strength of a self-etching adhesive system
Chemical substances used during biomechanical preparation of root canals can alter the composition of dentin surface and affect the interaction with restorative materials. OBJECTIVE: The purpose of this study was to evaluate the microtensile bond strength (µTBS) of a self-etching adhesive system to dentin irrigated with sodium hypochlorite (NaOCl) and ethyl
Journal of Applied Oral Science. Publicado em: 2010-08
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10. Fabrication and characterization of tellurite and germanate waveguides for optoelectronics applications. / Produção e caracterização de guias de onda de telureto e germanato para aplicações em optoeletrônica.
The objective of this work is the production and characterization of GeO2-PbO and TeO2-ZnO waveguides. The waveguides were produced using thin films and glasses by means of different procedures. The films were produced using the RF magnetron sputtering method and characterized by a variety of techniques. In particular, scanning electron microscopy was essent
Publicado em: 2010
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11. Corrosão anisotropica e formação de superficie nanoestruturada de Si utilizando plasma de alta densidade / Si anisotropic etching and nanostructured surface formation using high density plasma
This work explores the implementation, characterization and applications of BOSCH type process for bulk silicon etching (or bulk silicon micromachining) using inductively coupled high density plasma (ICP). This etching process is characterized by its high anisotropy and is performed by alternating etching steps, employing SF6 + Ar gas mixture, and passivatio
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 29/07/2009
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12. Influence of chlorhexidine concentration on microtensile bond strength of contemporary adhesive systems
The purpose of this study was to investigate the influence of chlorhexidine (CHX) concentration on the microtensile bond strength (μTBS) of contemporary adhesive systems. Eighty bovine central incisors were used in this study. The facial enamel surface of the crowns was abraded with 600-grit silicon carbide paper to expose flat, mid-coronal dentin surfaces.
Brazilian Oral Research. Publicado em: 2009-09