Fabrication Microelectronics
Mostrando 1-12 de 19 artigos, teses e dissertações.
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1. Sensor químico baseado em microponte de impedância = : Chemical sensor based on impedance microbridge / Chemical sensor based on impedance microbridge
A integração de sistemas microeletrônicos em lab-on-a-chip está sendo cada vez mais necessária para concretizar novas aplicações dentro do emergente campo da microfluídica. Tanto na química quanto na bioquímica e até mesmo na medicina e bioengenharia, a microfluídica evolui conquistando um espaço crescente. Entretanto, desafios tecnológicos res
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 31/07/2012
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2. Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
Positive photoresists are widely used in lithographic process in microelectronics and in optics for the fabrication of relief components. With the aim of identifying molecular modifications among positive photoresists unexposed and previously exposed to ultraviolet light the electron stimulated ion desorption technique coupled to time-of-flight mass spectrom
Química Nova. Publicado em: 2012
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3. Estudo de viabilidade de integração de micro-lâmpadas incandescentes com filtros interferenciais. / Study of viability of integration of incandescent micro-lamps with interferometric filters.
In the present work was realized a study of the viability of integrating two optical devices: incandescent micro-lamps and interferometric filters with the intention of obtaining a single device with specific characteristics. The fabrication of these optical devices was made using dielectric materials, obtained by plasma-enhanced chemical vapor deposition (P
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 07/04/2011
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4. Technology roadmap for development of SiC sensors at plasma processes laboratory
Abstract: Recognizing the need to consolidate the research and development (R&D) activities in microelectronics fields in a strategic manner, the Plasma Processes Laboratory of the Technological Institute of Aeronautics (LPP-ITA) has established a technology roadmap to serve as a guide for activities related to development of sensors based on silicon carbide
J. Aerosp. Technol. Manag.. Publicado em: 2010-08
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5. Corrosão anisotropica e formação de superficie nanoestruturada de Si utilizando plasma de alta densidade / Si anisotropic etching and nanostructured surface formation using high density plasma
This work explores the implementation, characterization and applications of BOSCH type process for bulk silicon etching (or bulk silicon micromachining) using inductively coupled high density plasma (ICP). This etching process is characterized by its high anisotropy and is performed by alternating etching steps, employing SF6 + Ar gas mixture, and passivatio
IBICT - Instituto Brasileiro de Informação em Ciência e Tecnologia. Publicado em: 29/07/2009
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6. Projeto e fabricação de nao-estruturas por litografa interferometrica / Design and fabrication of nano-structures by interforometric lithography
In this work the interferometric lithography technique was developed for recording periodic relief nano-structures, one and bi-dimensional, on silicon and glass substrates. In particular, the work is focused in two directions: the study of the profile of the structures recorded in photorresist, through the superimposition of interference light patterns, and
Publicado em: 2008
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7. Desenvolvimento de misturadores microfluídicos para fabricação de micro-esferas poliméricas. / Development of microfluidic mixers for fabrication of polymeric microspheres.
A microfluídica atua em áreas como controle de fluxo, e "química e ciências da vida". Nesta última área encontram-se dispositivos como micro-agulhas, micro-separadores, microdispensadores, micro-reatores e micromisturadores. Em particular, micromisturadores podem estar presentes nas mais variadas aplicações na industria e na ciência, que necessitam
Publicado em: 2007
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8. Desenvolvimento de micropontas de silício com eletrodos integrados para dispositivos de emissão por efeito de campo. / Development of silicon microtips with integrated electrical contacts for field emission devices.
This work presents a fabrication method of silicon microtips with integrated electrical contacts into the structure. Our motivation is the future development of field emission devices - FED, however our focus in this research is the microstructure fabrication process. This method is based on: (i) anisotropic under-etch method that occurs in the silicon subst
Publicado em: 2007
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9. Characterization of a microvalve using the piezoelectric polymer poly(viniyidene fluoride) (PVDF) integrated to a micronozzle end / Caracterização de uma microválvula fabricada usando o polímero piezoelétrico poli(fluoreto de vinilideno) (PVDF) integrada a saída de um microbocal sônico
This work describes the fabrication and test of a microvalve integrated in a micronozzle. The technique used to fabricate the micronozzles was powder blasting using aluminum oxide powder and glass as substrate. The microvalves are actuators made from PVDF (poli(vinylidene fluoride)), that is a piezoelectric polymer. The micronozzles have convergent-divergent
Publicado em: 2007
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10. Contribuições para melhoria do desempenho e viabilidade de fabricação de scanners indutivos / Contributions to improve the performance, and the manufacture viability of inductive scanners
Scanners are devices that deftects a light beam and converts a spot light in a well controlled amplitude and frequency scan line. Several applications uses the generated pattem to code or decode data, common examples ar,e barcode readers, and laser printers. A light beam can be deftected by different means. In this work, the scanner deftects the light by ref
Publicado em: 2006
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11. Fabrication and electrical characterization of field emission tips covered by DLC (Diamond Like Carbon) thin films / Fabricação e caracterização eletrica de ponteiras de emissão de campo recobertas com filme fino DLC (Diamond Like Carbon)
The objectives of this dissertation were the fabrication of silicon field emitter tips coated with diamond like carbon (DLC) thin films, and the study of its electrical behavior. We present the fabrication process of silicon tips that consists on four stages: photolithography, reactive ion etching SF6 plasma, thermal oxidation for sharpening, and the DLC dep
Publicado em: 2005
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12. Caracterização e otimização dos processos de fotolitografia aplicados na fabricação de dispositivos micrometricos MOS e microssistemas / MOS devices and MEMS photolithographic fabrication processes characterization and optimization
The aim of this work is to improve the photolithographic processes of the CCS/Unicamp. This work attempts findout and optimize the most significant process parameters for the fabrication of micrometric structures. Contrast, adhesion, resolution, and minimum dimension for the shapes were studied in order to improve the process and also determine their limitat
Publicado em: 2004