Micro Estruturas De Rubi
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1. Estudo das propriedades opto-eletrônicas de micro-cristais de rubi / Study of opto-electronics properties of ruby micro-crystals
Films of amorphous aluminum-nitride (AlN) were prepared by conventional radio frequency sputtering of an Al+Cr target in a plasma of pure nitrogen. The Cr-to-Al relative area determines the chromium content, which stayed in the ~ 0 3.33 at.% concentration range in the present study. Film deposition was followed by thermal annealing the samples up to 1050 ºC
Publicado em: 2010