Plasma Microelectronic
Mostrando 1-3 de 3 artigos, teses e dissertações.
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1. Fabrication and characterization of tellurite and germanate waveguides for optoelectronics applications. / Produção e caracterização de guias de onda de telureto e germanato para aplicações em optoeletrônica.
The objective of this work is the production and characterization of GeO2-PbO and TeO2-ZnO waveguides. The waveguides were produced using thin films and glasses by means of different procedures. The films were produced using the RF magnetron sputtering method and characterized by a variety of techniques. In particular, scanning electron microscopy was essent
Publicado em: 2010
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2. Caracterização de filmes finos de óxido de silício depositados em um reator HD-PECVD a partir de TEOS a ultra baixa temperatura. / Characterization of silicon dioxide thin films deposited in a HD-PECVD reactor from TEOS at ultra low temperature.
This work reports on the results obtained from high-density plasma enhanced chemical vapor deposited silicon oxide films at ultra low temperature, i.e. 30°C, using TEOS vapor as the silicon source oxidized with assistance of argon. The objectives of this work are: first, understand the phenomena that conducts the chemical vapor deposition in high density re
Publicado em: 2007
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3. Fabricação e caracterização de Guia de Onda Polimerica a base de PMMA modificado por plasma de CHF3 / Polymeric optical waveguides fabricated by plasma fluorination process
Polymeric optical devices have been studied in communication and interconnection optics due to the intrinsic versatility of polymers molecular structure, that allows advantageous refractive index modeling for core and cladding, and also to their easy fabrication process or patterning capability. PMMA, polymethylmetacrylate, shows the best optical properties
Publicado em: 2007