Thin Gate Oxide
Mostrando 1-7 de 7 artigos, teses e dissertações.
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1. Heterojunction between Al2O3 and SnO2 thin films for application in transparent FET
Alternative materials for use in electronic devices have grown interest in the past recent years. In this paper, the heterojunction SnO2/Al2O3 is tested concerning its use as a transparent insulating layer for use in FETs. The alumina layer is obtained by thermal annealing of metallic Al layer, deposited by resistive evaporation technique. Combination of und
Mat. Res.. Publicado em: 09/09/2014
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2. Analysis of electron direct tunneling current through very-thin gate oxides in MOS capacitors with the parallel-perpendicular kinetic energy components and anisotropic masses
An electron direct tunneling current model of n+- poly - Si/SiO2/p - Si(100) metal-oxide-semiconductor (MOS) capacitors has been developed by considering a parallel-perpendicular kinetic energy coupling, which is represented by the gate electron phase velocity, and anisotropic masses under a parabolic E-k dispersion relationship. The electron effective mass
Brazilian Journal of Physics. Publicado em: 2010-12
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3. Desenvolvimento de uma metodologia de fabricação de transistores de filmes finos orgânicos. / Development of a manufacturing methodology for organic thin film transistors.
In this work, it is presented a methodology for organic thin-film transistor (OTFT) fabrication. Poly(3-hexylthyophene) (P3HT):[6,6]-phenyl-C61-butyric acidmethyl ester (PCBM) bulk heterojunction solar cells were studied for their maximum power conversion efficiency (PCE) around 5 %. Efficiencies evolution in time from 10-6 to 1.7 % show the difficulties inv
Publicado em: 2010
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4. Isolantes de porta com altas constantes dieletricas (High K) para tecnologia MOS / High K gate insulators for MOS technology
High k insulators for the next generation (sub-32 nm CMOS (complementary metaloxide-semiconductor) technology), such as titanium oxide (TiOx), titanium oxynitride (TiOxNy), titanium-aluminum oxynitride (AlxTiwOyNz), titanium-aluminum nitride (AlxTiwNz) and titanium-aluminum oxide (AlxTiwOy), have been obtained by Ti or Ti/Al e-beam evaporation, with addition
Publicado em: 2008
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5. Morphological study of polycrystalline SiGe alloy deposited by vertical LPCVD
As device dimensions shrink to the deep-submicron scale, new challenges arises from the very small scale used and even poly crystalline silicon (poly-Si) presents problems as gate electrode. The use of SiGe as gate material can present many advantages over the poly-Si, as it leads to a lower boron penetration and gate depletion. In this paper authors present
Brazilian Journal of Physics. Publicado em: 2006-06
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6. Caracterização elétrica de capacitores obtidos através de tecnologia ultra-submicrométrica. / Electrical characterization of capacitors obtained through extreme-submicrometer technology.
In this work we present the study of polysilicon depletion and the gate tunneling current effects in thin-gate oxide devices. Characteristic curves of capacitance as a function of the gate voltage (C-V) were used to analyze the degradation caused for these effects. Regarding the poly depletion effect, a reduction of the total capacitance in the inversion reg
Publicado em: 2006
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7. High-temperature thin-catalytic gate devices for combustion emissions control
4H- and 6H-SiC Schottky diodes responding down to 5 ppm of NO and NO2 gases at temperatures up to 450ºC were fabricated. Upon exposure to gas, the forward current of the devices changes due to variations in the Schottky barrier height. For NO gas, the response follows a simple Langmuir adsorption model. Device parameters were evaluated from linear conductan
Brazilian Journal of Physics. Publicado em: 2004-06